Sputtering target
Grade：W/Mo/Ta/Ni/Ti
Spec：
Brand：MAIIB
Origin：Shaanxi-Baoji
Application：Aerospace, medical, electronics, petroleum, metall
Description：
Target materials (titanium target, zirconium target, chromium target, nickel target, molybdenum target, tungsten bar, aluminum target)
The coating target is a sputtering source that forms various functional thin films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions.
Common target specifications are: Φ100*40, Φ80*50, Φ80*40mm
Delivery state: Annealed state (M) Hot processed state (R) Cold processed state (Y)
Testing: mechanical properties, chemical composition testing, ultrasonic testing.
The coating target is a sputtering source that forms various functional thin films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions.
Common target specifications are: Φ100*40, Φ80*50, Φ80*40mm
Delivery state: Annealed state (M) Hot processed state (R) Cold processed state (Y)
Testing: mechanical properties, chemical composition testing, ultrasonic testing.
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